Fabrication of carbon nanomembranes by helium ion beam lithography

• Xianghui Zhang,
• Henning Vieker,
• André Beyer and
• Armin Gölzhäuser

Beilstein J. Nanotechnol. 2014, 5, 188–194, doi:10.3762/bjnano.5.20

• attachment; helium ion microscopy; ion beam-organic molecules interactions; self-assembled monolayers; Introduction Carbon nanomembranes (CNMs) with monomolecular thickness and macroscopic lateral size represent a new type of functional two-dimensional (2D) materials [1]. A universal scheme to fabricate